Dual-e-gun coater

Service:

We provide sample coating services by using E-beam evaporations
High reflective coatings (HR) and Anti-Reflective coating (AR)

Specification:

Description: coater contains two e-beam evaporators and ion gun for assisting and cleaning. One of the e-beam evaporators allows the use of material in the form of a ring. Thickness control is provided by two methods: the quartz sensor and the optical thickness monitor.

Characteristic:

1) E-gun

Max. operating voltage – 10 kV;
Max. emission current – 1 A;
Max. evaporator power – 10 kW;
Crucible volume – 12 ccm;
Number of crucibles – 15.

2) Ion gun

Type – End-Hall
Max. operating voltage – 200 V;
Max emission current – 5 A.

3) Thickness control

Number of quartz sensors – 4;
Wavelength range for optical thickness monitor – 360÷1000 nm;
Number of monitor glasses – 38.

4) Substrate

Substrate heating – tubular electric heaters;
Heating temperature – up to 250 C;
Substrate size and the number of substrates is customized. The maximum diameter of the substrate holder is 800 mm.

Available martials for deposition are Si, SiO2, Fe2O3, C2H5CO2Li, Ta2O5, TiO2, Nd2O3, Sb, Zn, MgO, Ni/Cr.

During the deposition process in the vacuum chamber can be added gases: Ar, O2, N2.

Material Restrictions:

Most substrates are allowed. Consult a staff member prior to new processes on substrates other than glass, quartz, or silicon. Only pure metals are recommended.

Charge: OEM

Fee subject to case-to-case negotiation with reference to: https://www.tiri.narl.org.tw/Service/Charge#

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